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Japanese Journal of Applied Physics

Volumn 41, Issue 12B, 2002, Pages L1419-L1421

A metastable precursor in the oxidation of Si(111)-(7 × 7)

(4) Okuyama, Hiroshi a Miki, Takashi a Aruga, Tetsuya a Nishijima, Mitsuaki a

a KYOTO UNIVERSITY (Japan)

Author keywords

Manipulation; Oxygen; Precursor; Scanning tunneling microscope; Silicon

Indexed keywords

MICROSCOPES; OXYGEN; SCANNING TUNNELING MICROSCOPY;

CHEMICAL CONFIGURATION; DOMINANT PRODUCT; INITIAL ADSORPTION; MANIPULATION; METASTABLE PRECURSORS; PRECURSOR; SI (1 1 1);

SILICON;

EID: 0942277859 PISSN: 00214922 EISSN: 13474065 Source Type: Journal
DOI: 10.1143/JJAP.41.L1419 Document Type: Article

Times cited : (9)

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