Reinterpretation of the molecular O2 chemisorbate in the initial oxidation of the Si(111)7 × 7 surface

Physical Review Letters

Volumn 85, Issue 3, 2000, Pages 630-633

  Matsui, F ^a   Yeom, H W ^b   Amemiya, K ^a   Tono, K ^a   Ohta, T ^a  

^a UNIVERSITY OF TOKYO   (Japan)

^b Yonsei University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION SPECTROSCOPY; CHEMISORPTION; DISSOCIATION; GAS ADSORPTION; OXIDATION; OXYGEN; X RAY SPECTROSCOPY;

CHEMISORBATE; NEAR EDGE X RAY ABSORPTION FINE STRUCTURE (NEXAFS) SPECTROSCOPY;

SEMICONDUCTING SILICON;

EID: 0034227509     PISSN: 00319007     EISSN: 10797114     Source Type: Journal    
DOI: 10.1103/PhysRevLett.85.630     Document Type: Article

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