Near edge x-ray absorption fine structure measurements of the interface between bottom antireflective coatings and a model deprotected photoresist

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 21, Issue 6, 2003, Pages 3153-3156

  Jablonski, Erin L ^a   Sambasivan, Sharadha ^a   Lin, Eric K ^a   Fischer, Daniel A ^a   Devadoss, Chelladurai ^b   Puligadda, Rama ^b  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

^b BREWER SCIENCE INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ADHESION; ANTIREFLECTION COATINGS; CROSSLINKING; INTERFACES (MATERIALS); LITHOGRAPHY; POLYMERS; ULTRAVIOLET RADIATION; X RAY SPECTROSCOPY;

BOTTOM ANTI-REFLECTIVE COATINGS (BARC); POLYMER NETWORKS;

PHOTORESISTS;

EID: 0942267510     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1621661     Document Type: Conference Paper

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