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Volumn 518, Issue 1-2, 2004, Pages 357-361
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Characterization of 13 and 30 μm thick hydrogenated amorphous silicon diodes deposited over CMOS integrated circuits for particle detection application
a
CERN
(Switzerland)
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Author keywords
[No Author keywords available]
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Indexed keywords
DEPOSITION;
DIODES;
HYDROGENATION;
LEAKAGE CURRENTS;
PARTICLE DETECTORS;
PULSED LASER APPLICATIONS;
THERMAL EFFECTS;
THIN FILMS;
VOLTAGE MEASUREMENT;
SILICON DIODES;
TRANSIMPEDANCE AMPLIFIERS;
AMORPHOUS SILICON;
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EID: 0942266478
PISSN: 01689002
EISSN: None
Source Type: Journal
DOI: 10.1016/j.nima.2003.11.022 Document Type: Conference Paper |
Times cited : (12)
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References (4)
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