Ferroelectric Bi3.4Eu0.6Ti3O12 thin films deposited on Si(1 0 0) and Pt/Ti/SiO2/Si(1 0 0) substrates by a sol-gel process

Journal of Crystal Growth

Volumn 262, Issue 1-4, 2004, Pages 327-333

  Kim, Won Jeong ^a   Kim, Sang Su ^a   Jang, Kiwan ^a   Bae, Ji Cheul ^a   Song, Tae Kwon ^a   Lee, Yong Ill ^a  

^a Changwon National University   (South Korea)

Author keywords

A3. Sol gel deposition; B1. Bismuth titanium oxides; B2. Ferroelectric fatigue; B3. Field effective transistor

Indexed keywords

ANNEALING; BISMUTH COMPOUNDS; CAPACITORS; DEPOSITION; ELECTRIC FIELDS; FIELD EFFECT TRANSISTORS; FILM GROWTH; POLARIZATION; SEMICONDUCTING SILICON; SOL-GELS; SPIN COATING; THIN FILMS;

BISMUTH TITANIUM OXIDES; FERROELECTRIC FATIGUE; SOL-GEL DEPOSITION;

FERROELECTRIC MATERIALS;

EID: 0842330008     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcrysgro.2003.10.036     Document Type: Article

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