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For CL, we have confirmed an ultimate lateral resolution better than 60 nm for III-V superlattices when operating the microscope at 2 keV of electron-beam energy. In the line scan mode, we have achieved 29-nm resolution for a GalnP/GaAs heterostructure. In specimens prepared for TEM observation, on the other hand, the best lateral resolution is achieved at the highest energy available at the microscope.
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The absence or presence of dislocations has to be confirmed from observations under different electron diffraction conditions in the TEM.
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