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Journal of Applied Physics

Volumn 94, Issue 12, 2003, Pages 7784-7788

Electron thermometry and refrigeration with doped silicon and superconducting electrodes

(7) Buonomo, B a Leoni, R a Castellano, M G a Mattioli, F a Torrioli, G a Di Gaspare, L b Evangelisti, F b

a IFN CNR (Italy)

b ROMA TRE UNIVERSITY (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM; CHEMICAL VAPOR DEPOSITION; CURRENT VOLTAGE CHARACTERISTICS; DOPING (ADDITIVES); ELECTRIC POTENTIAL; ELECTRODES; NIOBIUM; PHONONS; REFRIGERATION; SILICON; THIN FILMS; TUNNEL JUNCTIONS;

ELECTRON DISSIPATION; THERMAL DECOUPLING;

SUPERCONDUCTING DEVICES;

EID: 0348195819 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.1627952 Document Type: Article

Times cited : (9)

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