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Volumn 83, Issue 20, 2003, Pages 4193-4195
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Intrinsic compensation of silicon-doped AlGaN
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Author keywords
[No Author keywords available]
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Indexed keywords
BAND STRUCTURE;
CARRIER CONCENTRATION;
COMPOSITION;
ELECTRIC VARIABLES MEASUREMENT;
ELECTRON TRANSITIONS;
ELECTRONIC DENSITY OF STATES;
ENERGY GAP;
HALL EFFECT;
IONIZATION;
SCHOTTKY BARRIER DIODES;
SEMICONDUCTING SILICON;
SEMICONDUCTOR DOPING;
ALUMINUM GALLIUM NITRIDE;
ALUMINUM VACANCY;
CAPACITANCE TRANSIENTS;
CAPACITANCE-VOLTAGE MEASUREMENT;
DEEPENING;
INTRINSIC COMPENSATION;
MIDGAP STATES;
OPTICAL ISOTHERMAL CAPACITANCE TRANSIENT SPECTROSCOPY;
SEMICONDUCTING ALUMINUM COMPOUNDS;
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EID: 0347885305
PISSN: 00036951
EISSN: None
Source Type: Journal
DOI: 10.1063/1.1628396 Document Type: Article |
Times cited : (25)
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References (14)
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