Microcrystalline silicon germanium: an attractive bottom-cell material for thin-film silicon-based tandem-solar-cells

Materials Research Society Symposium - Proceedings

Volumn 467, Issue , 1997, Pages 681-691

  Ganguly, Gautam ^a   Ikeda, Toru ^a   Kajiwara, Kei ^a   Matsuda, Akihisa ^a  

^a ELECTROTECHNICAL LABORATORY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION SPECTROSCOPY; CHEMICAL BONDS; CHEMICAL VAPOR DEPOSITION; FILM GROWTH; HYDROGENATION; PLASMA APPLICATIONS; RAMAN SCATTERING; RAMAN SPECTROSCOPY; SEMICONDUCTING SILICON COMPOUNDS; SILANES; SILICON SOLAR CELLS; X RAY DIFFRACTION;

DANGLING BOND DENSITY; MICROCRYSTALLINE SILICON GERMANIUM; OPTICAL GAP; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SCHOTTKY TYPE CELL;

THIN FILMS;

EID: 0031372279     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-467-681     Document Type: Conference Paper

References (14)