High throughput characterization of the optical properties of compositionally graded combinatorial films

Applied Surface Science

Volumn 223, Issue 1-3, 2004, Pages 200-205

  Schenck, Peter K ^a   Kaiser, Debra L ^a   Davydov, Albert V ^a  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

Author keywords

Combinatorial; Optical properties; Reflectometry; Thin films

Indexed keywords

ANNEALING; COMPOSITION; ELECTRON BEAMS; OPTOELECTRONIC DEVICES; PHYSICAL VAPOR DEPOSITION; REFLECTOMETERS; SEMICONDUCTING SILICON; SPECTROSCOPIC ANALYSIS; THROUGHPUT; VAPORIZATION; X RAY DIFFRACTION ANALYSIS;

COMBINATIONAL CHEMISTRY; REFRACTION INDEX;

THIN FILMS;

EID: 0347565958     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2003.07.005     Document Type: Article

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