Growth characteristics and electrical resistivity of chemical vapor-deposited tungsten film

Thin Solid Films

Volumn 333, Issue 1-2, 1998, Pages 108-113

  Chang, I Shun ^a   Hon, Min Hsiung ^a  

^a NATIONAL CHENG KUNG UNIVERSITY   (Taiwan)

Author keywords

Chemical vapor deposition; Hydrogen; Tungsten; Tungsten hexaflouride

Indexed keywords

CHEMICAL REACTIONS; CHEMICAL VAPOR DEPOSITION; ELECTRIC CONDUCTIVITY OF SOLIDS; FILM GROWTH; HYDROGEN; TUNGSTEN; TUNGSTEN COMPOUNDS;

TUNGSTEN HEXAFLUORIDE;

THIN FILMS;

EID: 0347540088     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(98)00846-3     Document Type: Article

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