SiH4-WF6 gas-phase nucleated tungsten as an adhesion layer in blanket chemical vapor deposition for ultralarge scale integration

Journal of the Electrochemical Society

Volumn 144, Issue 3, 1997, Pages 996-1001

  Chang, Kow Ming ^a   Yeh, Ta Hsun ^a   Wang, Shih Wei ^a   Li, Chii Horng ^a  

^a NATIONAL CHIAO TUNG UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; ELECTRIC CONDUCTIVITY OF SOLIDS; HIGH TEMPERATURE EFFECTS; NUCLEATION; PHASE TRANSITIONS; PRESSURE EFFECTS; THIN FILMS; TITANIUM NITRIDE; VLSI CIRCUITS;

BLANKET CHEMICAL VAPOR DEPOSITION; IN SITU GAS PHASE NUCLEATION;

TUNGSTEN;

EID: 0031095711     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1837519     Document Type: Article

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