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Volumn 261, Issue 2-3, 2004, Pages 182-189
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Deposition behavior of GaN in AIX 200/4 RF-S horizontal reactor
b
STR Inc
(United States)
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Author keywords
A1. Computer simulation; A1. Heat and mass transfer; A3. Metalorganic vapor phase epitaxy; B1. Nitrides
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Indexed keywords
ALUMINUM COMPOUNDS;
AMMONIA;
CHEMICAL REACTORS;
COOLING;
DECOMPOSITION;
DEPOSITION;
FLOW PATTERNS;
HEAT TRANSFER;
HEATING;
MASS TRANSFER;
METALLORGANIC VAPOR PHASE EPITAXY;
MOLECULAR WEIGHT;
OPTIMIZATION;
RESEARCH AND DEVELOPMENT MANAGEMENT;
SAPPHIRE;
COOLING CHANNELS;
FLOW RATES;
GALLIUM NITRIDE;
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EID: 0347415804
PISSN: 00220248
EISSN: None
Source Type: Journal
DOI: 10.1016/j.jcrysgro.2003.11.010 Document Type: Conference Paper |
Times cited : (19)
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References (11)
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