Performance of sub-atmospheric pressure hydride gas source and delivery system for MOCVD

Journal of Crystal Growth

Volumn 261, Issue 2-3, 2004, Pages 241-248

  Raynor, M W ^a   Houlding, V H ^a   Frye, R ^b   Griffing, S ^b   Clark, A ^c   Walterson, B ^c  

^a Matheson Tri Gas Inc   (United States)

^b ENTEGRIS INC   (United States)

^c HONEYWELL   (United States)

Author keywords

A1. Adsorption; A1. Characterization; A1. Impurities; A3. Metalorganic chemical vapor deposition; B2. Semiconducting III V materials

Indexed keywords

ATMOSPHERIC PRESSURE; CONTAMINATION; DIFFUSION; GAS ADSORPTION; GAS CHROMATOGRAPHY; HYDRIDES; IMPURITIES; INERT GASES; MOISTURE; OPTOELECTRONIC DEVICES; OXYGEN; PHOTOLUMINESCENCE; SECONDARY ION MASS SPECTROMETRY; TRANSPORTATION;

DELIVERY SYSTEMS; DISCHARGE IONIZATION;

METALLORGANIC CHEMICAL VAPOR DEPOSITION;

EID: 0347415794     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcrysgro.2003.11.015     Document Type: Conference Paper

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