Advances in ion implanter productivity and safety

Solid State Technology

Volumn 39, Issue 12, 1996, Pages 69-74

  Romig, Terry ^a,d,e   McManus, Jim ^b,f,g   Olander, Karl ^b,g,h,i,j,k   Kirk, Ralph ^c,l,m,n  

^a SEMATECH   (United States)

^b Advanced Technology Materials Inc   (United States)

^c Matheson Gas Products   (United States)

^d TEXAS A AND M UNIVERSITY   (United States)

^e National Semiconductor

^f STATE UNIVERSITY OF NEW YORK AT FREDONIA   (United States)

^g Advanced Technology Materials

^h UNIVERSITY OF ILLINOIS AT URBANA CHAMPAIGN   (United States)

ⁱ NovaSource Division

^j Novapure Corp

^k MILLIPORE CORPORATION   (United States)

^l UNIVERSITY OF CALIFORNIA   (United States)

^m Electronics Products Group ^*

ⁿ Electronics Products Group

more..

Author keywords

[No Author keywords available]

Indexed keywords

ACCIDENT PREVENTION; ATMOSPHERIC PRESSURE; DESORPTION; GAS ADSORPTION; INTEGRATED CIRCUIT MANUFACTURE; ION SOURCES; PRODUCTIVITY; SEMICONDUCTOR DOPING;

GAS SOURCES;

ION IMPLANTATION;

EID: 0030308761     PISSN: 0038111X     EISSN: None     Source Type: Trade Journal    
DOI: None     Document Type: Article

References (17)

1. Ion Implantation Science and Technology, edited by James Ziegler, Ion Implantation Technology Corp., 1966.
2. P. Pei, H.R. Kirby, 'Next Generation Processes and Equipment that Lead to Positive Environmental, Safety and Health Impacts, Semiconductor Fabtech. pp. 25-29, ICG Publishing, 1996.
3. Pocket Guide to Chemical Hazards, NIOSH Publications, Cincinnati, OH, June 1994.
4. J.V. McManus, G.M. Tom, R. Kirk, 'A Zeolite-based Atmosphere Pressure Hydride Gas Source for Ion Implantation,' Proc. of the X Int. Ion Implant Tech. Conf., pp. 523-526, June 1994.
5. 3 Gas Bottles on the Varian E500 Implanter,' Proc. of the X Int. Ion Implant Tech. Conf., pp. 519-622, June 1994.
6. K. Brown, S. Walther, J. Jillson, 'Ion Implanter Testing and Process Results Using Low-pressure, Zeolite-based Gas Bottles in Medium and High Current Ion Implanters,' Proc. of the XI Int. Ion Implant Tech. Conf., to be published (IEEE).
7. R.L. Brown, 'SDS Gas Source Feed Material Systems for Ion Implantation,' Proc. of the XI Int. Ion Implant Tech. Conf., to be published (IEEE).
8. US Patent No. 4,744,221 entitled 'Zeolite-based Arsine Storage and Delivery System,' May 17, 1988.
9. US Patent No. 5,518,528 entitled 'Storage and Delivery System for Gaseous Hydride, Halide and Organometallic Group V Compounds,' May 21, 1996.
10. T. Marin, W.G. Boyd Jr., J.V. McManus, 'Performance of the SDS, High-pressure Hydrides and Solid Vaporlzer Feed Materials on a 9500xR Implanter,' Proc. of the XI Int. Ion Implant Tech. Conf., to be published (IEEE).
11. S.J. Gregg, K.S.W. Sing, Adsorption, Surface Area and Porosity. Academic Press, 1982.
12. D.P. Valenzuela, A.L. Myers, Adsorption Equilibrium Handbook, Prentice Hall, Englewood Cliffs, NJ, 1989.
13. J.V. McManus, D. Edwards, R. Kirk, 'New Developments in SDS Technology for Ion Implantation,' Proc. of the XI Int. Ion Implant Tech. Conf., to be published (IEEE).
14. R.T. Yang, Gas Separation by Adsorption Processes, Butterworth, New York, 1987.
15. OEE model courtesy of James Neroda, Eaton Corp., Beverly, MA.
16. B.E.P. Beeston, 'Ion Implant Modeling Does it Give Us What We Want?' Proc. of the XI Int. Ion Implant Tech. Conf., to be published (IEEE).
17. The complete report is available from Advanced Technology Materials Inc. upon request.