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Volumn 766, Issue , 2003, Pages 503-508

Reduced time for uniform etching of Cu power planes during FIB editing

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL ORIENTATION; CRYSTALS; DIELECTRIC MATERIALS; DRY ETCHING; ION BEAMS; ION BOMBARDMENT; METALLIZING;

EID: 0346938314     PISSN: 02729172     EISSN: None     Source Type: Journal    
DOI: 10.1557/proc-766-e3.10     Document Type: Article
Times cited : (4)

References (5)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.