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Volumn 766, Issue , 2003, Pages 503-508
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Reduced time for uniform etching of Cu power planes during FIB editing
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Author keywords
[No Author keywords available]
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Indexed keywords
CRYSTAL ORIENTATION;
CRYSTALS;
DIELECTRIC MATERIALS;
DRY ETCHING;
ION BEAMS;
ION BOMBARDMENT;
METALLIZING;
COPPER METALLIZATIONS;
CRYSTALLITES;
FOCUSED ION BEAM;
COPPER;
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EID: 0346938314
PISSN: 02729172
EISSN: None
Source Type: Journal
DOI: 10.1557/proc-766-e3.10 Document Type: Article |
Times cited : (4)
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References (5)
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