Direct inversion of interfacial reflectivity data using the Patterson function

Journal of Applied Crystallography

Volumn 36, Issue 6, 2003, Pages 1352-1355

  Bataillou, Benoît ^a,b,c   Moriceau, Hubert ^b   Rieutord, François ^a  

^a CEA GRENOBLE   (France)

^b CEA LETI   (France)

^c PARC TECHNOLOGIQUE DES FONTAINES   (France)

Author keywords

[No Author keywords available]

Indexed keywords

SILICON; SILICON OXIDE; UNCLASSIFIED DRUG;

ARTICLE; LIGHT SCATTERING; MATHEMATICAL ANALYSIS; MODEL; REFLECTOMETRY; X RAY;

EID: 0346749435     PISSN: 00218898     EISSN: None     Source Type: Journal    
DOI: 10.1107/S0021889803016649     Document Type: Article

References (12)

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