High-energy x-ray reflectivity of buried interfaces created by wafer bonding

Physical Review B - Condensed Matter and Materials Physics

Volumn 63, Issue 12, 2001, Pages 1254081-1254085

  Rieutord, F ^a   Eymery, J ^a   Fournel, F ^a   Buttard, D ^a   Oeser, R ^a   Plantevin, O ^a   Moriceau, H ^b   Aspar, B ^b  

^a CEA GRENOBLE   (France)

^b CEA LETI   (France)

Author keywords

[No Author keywords available]

Indexed keywords

OXIDE; WATER;

ARTICLE; CHEMICAL BINDING; DEVICE; ELECTRONICS; ENERGY; MECHANICS; REFLECTOMETRY; STRUCTURE ANALYSIS; TEMPERATURE DEPENDENCE; X RAY ANALYSIS; X RAY DIFFRACTION;

EID: 0005957845     PISSN: 01631829     EISSN: None     Source Type: Journal    
DOI: 10.1103/physrevb.63.125408     Document Type: Article

References (11)