Ar dilution effects on hydrogen concentration and mass density obtained by X-ray and neutron reflectivity on hydrogenated amorphous nitride thin films

Applied Physics A: Materials Science and Processing

Volumn 74, Issue SUPPL.II, 2002, Pages

  Santucci, S ^a   Valentini, L ^b   Menelle, A ^c   Lozzi, L ^a   Coppola, R ^d   Kenny, J M ^b  

^a UNIVERSITY OF L'AQUILA   (Italy)

^b UNIVERSITY OF PERUGIA   (Italy)

^c CEA SACLAY   (France)

^d ENEA C R CASACCIA   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS MATERIALS; ARGON; DENSITY (SPECIFIC GRAVITY); HYDROGENATION; NEUTRON REFLECTION; NEUTRON SCATTERING; NITRIDES; NITROGEN; PLASMAS; SEMICONDUCTOR DOPING; X RAY ANALYSIS;

ARGON PLASMA DILUTION; HYDROGEN CONCENTRATION; HYDROGENATED AMORPHOUS NITRIDE THIN FILM; MASS DENSITY; NITROGEN DOPED AMORPHOUS CARBON; NITROGEN RICH PLASMA ATMOSPHERE; X RAY REFLECTIVITY;

THIN FILMS;

EID: 0346667011     PISSN: 09478396     EISSN: None     Source Type: Journal    
DOI: 10.1007/s003390101199     Document Type: Article

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