Thermalization gap of a-Si:H well layer in a-Si:H/a-Si3N4:H multilayers

Journal of Non-Crystalline Solids

Volumn 266-269 B, Issue , 2000, Pages 1072-1076

  Murayama, K ^a   Katagiri, N ^a   Ouno, K ^a   Nakata, H ^a   Miyazaki, S ^b   Hirose, M ^b  

^a NIHON UNIVERSITY   (Japan)

^b HIROSHIMA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0346482206     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0022-3093(99)00905-9     Document Type: Article

References (9)

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