Molecular dynamics study of deposition mechanism of cubic boron nitride

Science and Technology of Advanced Materials

Volumn 2, Issue 2, 2001, Pages 349-356

  Koga, H ^a   Nakamura, Y ^a,b   Watanabe, S ^a,b   Yoshida, T ^a  

^a UNIVERSITY OF TOKYO   (Japan)

^b JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

Author keywords

Cubic boron nitride; Defects; Growth models; Hexagonal boron nitride; Ion bombardment; Molecular dynamics; Nucleation; Rhombohedral boron nitride; Thin films

Indexed keywords

EID: 0346451632     PISSN: 14686996     EISSN: None     Source Type: Journal    
DOI: 10.1016/S1468-6996(01)00011-0     Document Type: Article

References (22)

1. L. Vel, G. Demazeau, J. Etourneau, Cubic boron nitride: synthesis, physicochemical properties and applications, Mater. Sci. Engng, B 10 (1991) 149-164.
2. R.H. Wentorf Jr, Preparation of semiconducting cubic boron nitride, J. Chem. Phys. 36 (1962) 1990-1991.
3. O. Mishima, K. Era, J. Tanaka, S. Yamaoka, Ultraviolet light-emitting diode of a cubic boron nitride pn junction made at high pressure, Appl. Phys. Lett. 53 (1988) 962-964.
4. K. Inagawa, K. Watanabe, H. Ohsone, K. Saitoh, A. Itoh, Preparation of cubic boron nitride film by activated reactive evaporation with a gas activation nozzle, J. Vac. Sci. Technol., A 5 (1987) 2696-2700.
5. K. Inagawa, K. Watanabe, K. Saitoh, Y. Yuchi, A. Itoh, Structure and properties of c-BN film deposited by activated reactive evaporation with a gas activation nozzle, Surf. Coat. Technol. 39/40 (1989) 253-264.
6. D.R. McKenzie, W.D. McFall, W.G. Sainty, C.A. Davis, R.E. Collins, Compressive stress induced formation of cubic boron nitride, Diamond Relat. Mater. 2 (1993) 970-976.
7. P.B. Mirkarimi, K.F. McCarty, D.L. Medlin, Review of advances in cubic boron nitride film synthesis, Mater. Sci. Engng, R 21 (1997) 47-100.
8. J. Robertson, Deposition mechanism of cubic boron nitride, Diamond Relat. Mater. 5 (1996) 519-524.
9. D.R. McKenzie, D.J.H. Cockayne, D.A. Muller, M. Murakawa, S. Miyake, S. Watanabe, P. Fallon, Electron optical characterization of cubic boron nitride thin films prepared by reactive ion plating, J. Appl. Phys. 70 (1991) 3007-3012.
10. P.B. Mirkarimi, K.F. McCarty, D.L. Medlin, W.G. Wolfer, T.A. Friedmann, E.J. Klaus, G.F. Cardinale, D.G. Howitt, On the role of ions in the formation of cubic boron nitride films by ion-assisted deposition, J. Mater. Res. 9 (1994) 2925-2938.
11. J.P. Biersack, L.G. Haggmark, A Monte Carlo computer program for the transport of energetic ions in amorphous targets, Nucl. Instrum. Meth. 174 (1980) 257-269.
12. W. Dworschak, K. Jung, H. Ehrhardt, Growth mechanism of cubic boron nitride in a r.f. glow discharge, Thin Solid Films 254 (1995) 65-74.
13. K. Albe, W. Möller, Modelling of boron nitride: atomic scale simulations on thin film growth, Comp. Mater. Sci. 10 (1998) 111-115.
14. K. Albe, W. Möller, K.-H. Heinig, Computer simulation and boron nitride, Radiat. Eff. Defects Solids 141 (1997) 85-97.
15. J. Tersoff, New empirical approach for the structure and energy of covalent systems, Phys. Rev. B 37 (1988) 6991-7000.
16. J. Tersoff, Modeling solid-state chemistry: interatomic potentials for multicomponent systems, Phys. Rev. B 39 (1989) 5566-5568.
17. W.C. Swope, H.C. Andersen, P.H. Berens, K.R. Wilson, A computer simulation method for the calculation of equilibrium constants for the formation of physical clusters of molecules: application to small water clusters, J. Chem. Phys. 76 (1982) 637-649.
18. H.J.C. Berendsen, J.P.M. Postma, W.F. van Gunsteren, A. DiNola, J.R. Haak, Molecular dynamics with coupling to an external bath, J. Chem. Phys. 81 (1984) 3684-3690.
19. D.V. Shtansky, O. Tsuda, Y. Ikuhara, T. Yoshida, Crystallography and structural evolution of cubic boron nitride films during bias sputter deposition, Acta Mater. 48 (2000) 3745-3759.
20. Y. Yamada-Takamura, O. Tsuda, H. Ichinose, T. Yoshida, Atomicscale structure at the nucleation site of cubic boron nitride deposited from the vapor phase, Phys. Rev. B 59 (1999) 10351-10355.
21. H. Hofsäss, H. Feldermann, M. Sebastian, C. Ronning, Thresholds for the phase formation of cubic boron nitride thin films, Phys. Rev. B 55 (1997) 13230-13233.
22. D. Brenner, Empirical potential for hydrocarbons for use in simulating the chemical vapor deposition of diamond films, Phys. Rev. B 42 (1990) 9458-9471.