Intrinsic Josephson junctions fabricated in a well-controlled way

Superconductor Science and Technology

Volumn 16, Issue 12, 2003, Pages 1361-1364

  You, L X ^a   Wu, P H ^a   Ji, Z M ^a   Fan, S X ^a   Xu, W W ^a   Kang, L ^a   Lin, C T ^b   Liang, B ^b  

^a NANJING UNIVERSITY   (China)

^b MAX PLANCK INSTITUT FÜR FESTKÖRPERFORSCHUNG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; BISMUTH COMPOUNDS; CRITICAL CURRENT DENSITY (SUPERCONDUCTIVITY); CURRENT VOLTAGE CHARACTERISTICS; ELECTRIC CURRENT MEASUREMENT; ELECTRIC RESISTANCE; ETCHING;

ARGON ION MILLING; INTRINSIC JOSEPHSON JUNCTIONS; NONLINEAR RESISTANCE;

JOSEPHSON JUNCTION DEVICES;

EID: 0346413332     PISSN: 09532048     EISSN: None     Source Type: Journal    
DOI: 10.1088/0953-2048/16/12/008     Document Type: Conference Paper

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