Effect of hydrogen plasma for obtaining high quality a-SiGe:H alloys

Solid State Communications

Volumn 99, Issue 4, 1996, Pages 269-272

  Xu, Jun ^a   Chen, Kunji ^a   Feng, Duan ^a   Miyazaki, Seiichi ^b   Hirose, Masataka ^b  

^a NANJING UNIVERSITY   (China)

^b HIROSHIMA UNIVERSITY   (Japan)

Author keywords

Amorphous SiGe Alloys; Hydrogen Plasma

Indexed keywords

AMORPHOUS ALLOYS; ANNEALING; CRYSTAL DEFECTS; CRYSTAL STRUCTURE; HYDROGEN; PLASMAS; SEMICONDUCTING SILICON COMPOUNDS; THERMAL EFFECTS; THIN FILMS;

AMORPHOUS SILICON GERMANIUM ALLOYS; FILM QUALITY; HYDROGEN PLASMA; HYDROGEN PLASMA ANNEALING; HYDROGEN PLASMA EFFECT; THIN FILM DEPOSITION;

PLASMA APPLICATIONS;

EID: 0030195557     PISSN: 00381098     EISSN: None     Source Type: Journal    
DOI: 10.1016/0038-1098(96)00182-2     Document Type: Article

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