Near-field imaging of surface plasmon on gold nano-dots fabricated by scanning probe lithography

Journal of Microscopy

Volumn 209, Issue 3, 2003, Pages 236-240

  Kim, J ^a,b   Song, K I B ^b   Lee, S Q ^b   Kim, E U N K ^b   Choi, S E U L ^a   Lee, Y ^a   Park, K H O ^b  

^a SolarLight Ltd   (South Korea)

^b Electronics and Telecommunications Research Institute (ETRI)   (South Korea)

Author keywords

Field induced diffusion; Local field enhancement; Nano oxidation; Nanofabrication; Near field imaging; Plasmon; Scanning probe lithography; SNOM

Indexed keywords

ATOMIC FORCE MICROSCOPY; FABRICATION; GOLD COATINGS; INCIDENT LIGHT; LITHOGRAPHY; NANODOTS; OPTICAL DATA STORAGE; SURFACE PLASMONS;

FIELD-INDUCED; FIELD-INDUCED DIFFUSION; GOLD NANO; LOCAL FIELD ENHANCEMENT; NANO-OXIDATION; NANODOTS; NEAR FIELD IMAGING; SCANNING NEAR-FIELD OPTICAL MICROSCOPY; SCANNING PROBE LITHOGRAPHY; SURFACE-PLASMON;

NEAR FIELD SCANNING OPTICAL MICROSCOPY;

GOLD;

ANALYTIC METHOD; ARTICLE; ATOMIC FORCE MICROSCOPY; DIFFUSION; ELECTRIC CONDUCTIVITY; ELECTRIC POTENTIAL; LIGHT; MATERIAL COATING; MICROSCOPE; MOLECULAR SIZE; OXIDATION; POLARIZATION; PRIORITY JOURNAL; SCANNING NEAR FIELD OPTICAL MICROSCOPY; SCANNING PROBE LITHOGRAPHY; SURFACE PROPERTY;

EID: 0345701394     PISSN: 00222720     EISSN: None     Source Type: Journal    
DOI: 10.1046/j.1365-2818.2003.01132.x     Document Type: Article

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