AFM force-distance curve methods for measuring the kinetics of silicon chemical etching and reactions between silylating agents and a silicon surface

Langmuir

Volumn 15, Issue 6, 1999, Pages 2077-2079

  Grinevich, Oleg ^a   Mejiritski, Alexander ^a   Neckers, D C ^a  

^a BOWLING GREEN STATE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AGING OF MATERIALS; ATOMIC FORCE MICROSCOPY; ETCHING; LUMINESCENCE; OXIDATION; REACTION KINETICS;

FORCE-DISTANCE CURVE; SILYLATING AGENTS;

POROUS SILICON;

EID: 0345534811     PISSN: 07437463     EISSN: None     Source Type: Journal    
DOI: 10.1021/la981107r     Document Type: Article

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