Structural characterization of self-assembled monolayers by unenhanced Raman spectroscopy

Journal of Raman Spectroscopy

Volumn 34, Issue 11, 2003, Pages 902-906

  Choplin, F ^a   Navarre, S ^a   Bousbaa, J ^a   Babin, P ^a   Bennetau, B ^a   Bruneel, J L ^a   Desbat, B ^a  

^a UNIVERSITÉ DE BORDEAUX   (France)

Author keywords

Chlorosilane compounds; Mapping; Self assembled monolayers; Silicon wafers; Unenhanced Raman scattering

Indexed keywords

ATOMIC FORCE MICROSCOPY; CHLORINE COMPOUNDS; MICROMETERS; SELF ASSEMBLED MONOLAYERS; SILICA; SILICON WAFERS;

CHLOROSILANE COMPOUND; CHLOROSILANES; CLEANING PROCEDURES; CONFOCAL RAMAN MICROSCOPES; ETHYL-ACETATE; MICROMETER SCALE; MICROMETER-SCALE; MONOLAYER FORMATION; STRUCTURAL CHARACTERIZATION; UNENHANCED RAMAN SCATTERING;

RAMAN SCATTERING;

2 (22 TRICHLOROSILANYLDOCOSOXY)ETHYLACETATE; ACETIC ACID DERIVATIVE; DETERGENT; SILICON DIOXIDE; UNCLASSIFIED DRUG;

ARTICLE; ATOMIC FORCE MICROSCOPY; CLEANING; CONFOCAL MICROSCOPY; QUALITY CONTROL; RAMAN SPECTROMETRY;

EID: 0344980606     PISSN: 03770486     EISSN: None     Source Type: Journal    
DOI: 10.1002/jrs.1073     Document Type: Article

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