Temperature influence on the formation of silanized monolayers on silica: An atomic force microscopy study

Surface Science

Volumn 352-354, Issue , 1996, Pages 369-373

  Davidovits, J V ^a,b   Pho, V ^a   Silberzan, P ^a   Goldmann, M ^a  

^a INSTITUT CURIE   (France)

^b Ctr Europ de Rech et Technologie ^*  (France)

Author keywords

Atomic force microscopy; Glass surfaces; Physical adsorption; Self assembly; Silane; Surface structure, morphology, roughness, and topography; Surface thermodynamics

Indexed keywords

ADSORPTION; ATOMIC FORCE MICROSCOPY; GLASS; MORPHOLOGY; SILANES; SILICA; SILICON WAFERS; SURFACE ROUGHNESS; SURFACE STRUCTURE; SURFACES; THERMAL EFFECTS; THERMODYNAMICS;

LANGMUIR FILMS; OCTADECYLTRICHLOROSILANE; SELF ASSEMBLY; SURFACE THERMODYNAMICS; TOPOGRAPHY;

MONOLAYERS;

EID: 0030145010     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/0039-6028(95)01162-5     Document Type: Article

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