Nanometer level etching and deposition of Bi-Sr-Ca-Cu-O superconducting thin films

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 2697, Issue , 1996, Pages 217-227

  Sakai, Shigeki ^a   Oohira, Tsunehiro ^a   Kasai, Yuji ^a   Migita, S ^a,b   Suzuki, A ^a,c  

^a ELECTROTECHNICAL LABORATORY   (Japan)

^b NEW ENERGY AND INDUSTRIAL TECHNOLOGY DEVELOPMENT ORGANIZATION   (Japan)

^c UNIVERSITY OF TSUKUBA   (Japan)

Author keywords

Atomic absorption spectroscopy; BiSrCaCuO superconductor; CaO; Digital etching; Gas laser etching; Molecular beam epitaxy; SrO; Thin films

Indexed keywords

ABSORPTION; ATOMIC PHYSICS; ATOMIC SPECTROSCOPY; ATOMS; CALCIUM; COPPER; CRYSTAL GROWTH; ELECTRIC CONDUCTIVITY; ETCHING; GAS ABSORPTION; GAS FUEL PURIFICATION; GASES; GROWTH (MATERIALS); INDUCTIVELY COUPLED PLASMA; LASERS; MOLECULAR BEAM EPITAXY; MOLECULAR BEAMS; MOLECULAR DYNAMICS; OPTICAL COMMUNICATION; OXIDE FILMS; OXIDE SUPERCONDUCTORS; OZONE; REFLECTION HIGH ENERGY ELECTRON DIFFRACTION; SEMICONDUCTOR QUANTUM WIRES; SOLIDS; SUBSTRATES; SUPERCONDUCTING FILMS; SUPERCONDUCTING MATERIALS; SUPERCONDUCTIVITY; THIN FILMS;

ATOMIC ABSORPTION SPECTROSCOPY; BISRCACUO SUPERCONDUCTOR; CAO; DIGITAL ETCHING; SRO;

ABSORPTION SPECTROSCOPY;

EID: 0344891729     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.250244     Document Type: Conference Paper

References (9)

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