Digital method of gas laser etching for oxide superconductors

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 35, Issue 1 B, 1996, Pages

  Oohira, Tsunehiro ^a   Sakai, Shigeki ^a   Kasai, Yuji ^a   Shimizu, Tetuo ^a   Tokumoto, Hiroshi ^a   Shimizu, Keizo ^a  

^a ELECTROTECHNICAL LABORATORY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; BISMUTH COMPOUNDS; ETCHING; HIGH TEMPERATURE SUPERCONDUCTORS; LASER APPLICATIONS; MORPHOLOGY; SUPERCONDUCTING FILMS; SURFACES;

BISMUTH STRONTIUM CALCIUM COPPER OXIDES; DIGITAL ETCHING METHOD; GAS ASSISTED LASER ETCHING; LAYER BY LAYER ETCHING;

OXIDE SUPERCONDUCTORS;

EID: 0029736093     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.35.l94     Document Type: Article

References (9)