Highly ordered vacuum-deposited thin films of copper phthalocyanine induced by electric field

Thin Solid Films

Volumn 347, Issue 1-2, 1999, Pages 299-301

  Hu, W P ^a   Liu, Y Q ^a   Zhou, S Q ^a   Tao, J ^a   Xu, D F ^a   Zhu, D B ^a  

^a INSTITUTE OF CHEMISTRY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; COPPER COMPOUNDS; ELECTRIC FIELDS; ELECTRIC RESISTANCE; ELECTRIC VARIABLES MEASUREMENT; EVAPORATION; GLASS; MOLECULES; SUBSTRATES; VACUUM; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

COPPER PHTHALOCYANINE; HIGHLY ORDERED VACUUM DEPOSITED THIN FILMS; ORGANIC SEMICONDUCTORS;

THIN FILMS;

EID: 0344771147     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(99)00010-3     Document Type: Article

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