Improvement in gate oxide integrity on thin-film silicon-on-insulator substrates by lateral gettering

Applied Physics Letters

Volumn 71, Issue 23, 1997, Pages 3397-3399

  Hong, S Q ^a   Wetteroth, T ^a   Shin, H ^a   Wilson, S R ^a   Werho, D ^a   Lee, T C ^a   Schroder, D K ^b  

^a MOTOROLA INC   (United States)

^b Arizona State University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0344717203     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.120347     Document Type: Article

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