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Volumn 201, Issue , 1999, Pages 178-182
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Growth and structural characteristics of (Ga,Al)As Bragg reflectors grown by MBE on nominal and vicinal (1 1 1)B GaAs substrates
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Author keywords
[No Author keywords available]
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Indexed keywords
ATOMIC FORCE MICROSCOPY;
MOLECULAR BEAM EPITAXY;
MULTILAYERS;
OPTOELECTRONIC DEVICES;
SEMICONDUCTING ALUMINUM COMPOUNDS;
SEMICONDUCTING GALLIUM ARSENIDE;
SEMICONDUCTOR DEVICE STRUCTURES;
TRANSMISSION ELECTRON MICROSCOPY;
BRAGG REFLECTORS;
SEMICONDUCTOR GROWTH;
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EID: 0344614027
PISSN: 00220248
EISSN: None
Source Type: Journal
DOI: 10.1016/S0022-0248(98)01313-X Document Type: Article |
Times cited : (2)
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References (7)
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