Initial surface topography changes during divalent dissolution of silicon electrodes

Electrochimica Acta

Volumn 49, Issue 1, 2003, Pages 137-146

  Jakubowicz, J ^a   Jungblut, H ^a   Lewerenz, H J ^a  

^a HAHN MEITNER INSTITUT   (Germany)

Author keywords

Atomic force microscopy; Divalent dissolution; Pit formation; Silicon; Synchrotron radiation photoelectron spectroscopys

Indexed keywords

ATOMIC FORCE MICROSCOPY; DISSOLUTION; ELECTRIC POTENTIAL; ELECTROCHEMICAL CORROSION; ELECTROLYTES; PHOTOELECTRON SPECTROSCOPY; SEMICONDUCTING SILICON; SURFACE REACTIONS; SURFACE ROUGHNESS; SYNCHROTRON RADIATION;

DISSOLUTION CHARGES;

ELECTROCHEMICAL ELECTRODES;

EID: 0344465944     PISSN: 00134686     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.electacta.2003.06.001     Document Type: Conference Paper

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