Photo- and potential-controlled nanoporous silicon formation on n-Si(111): An in-situ FTIR investigation

Thin Solid Films

Volumn 276, Issue 1-2, 1996, Pages 25-28

  Rappich, J ^a   Lewerenz, H J ^a  

^a HAHN MEITNER INSTITUT   (Germany)

Author keywords

Electrochemistry; Fourier transform infrared spectroscopy; Nanostructures; Surface morphology

Indexed keywords

CURRENT DENSITY; ELECTROCHEMISTRY; FOURIER TRANSFORM INFRARED SPECTROSCOPY; LIGHT REFLECTION; MORPHOLOGY; NANOSTRUCTURED MATERIALS; POROSITY; SCANNING ELECTRON MICROSCOPY; SURFACE ROUGHNESS;

INTERNAL REFLECTION MEASUREMENTS; MICROTOPOGRAPHY; NANOPOROUS SILICON; PHOTOCURRENT DENSITY;

POROUS SILICON;

EID: 0030124694     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/0040-6090(95)08041-4     Document Type: Article

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