Methodology for feedback variable selection for control of semiconductor manufacturing process - Part 2: Application to reactive ion etching

IEEE Transactions on Semiconductor Manufacturing

Volumn 16, Issue 4, 2003, Pages 588-597

  Patterson, Oliver D ^a   Dong, Xiaobin ^b   Khargonekar, Pramod P ^c   Nair, Vijayan N ^d   Grimard, Dennis S ^e  

^a AGERE SYSTEMS   (United States)

^b HARVARD UNIVERSITY   (United States)

^c J Crayton Pruitt Family Department of Biomedical Engineering   (United States)

^d UNIVERSITY OF MICHIGAN   (United States)

^e The Department of Civil and Environmental Engineering   (United States)

Author keywords

Feedback control; Feedback variable selection; Parametric variarion; Reactive ion etch; Regression analysis; Subset selection; Variance reduction

Indexed keywords

EMISSION SPECTROSCOPY; FEEDBACK CONTROL; LEAST SQUARES APPROXIMATIONS; MATHEMATICAL MODELS; PRINCIPAL COMPONENT ANALYSIS; PROCESS CONTROL; REACTIVE ION ETCHING; REGRESSION ANALYSIS;

FEEDBACK VARIABLE SELECTION; GATE ETCH PROCESS; LEAST SQUARES REGRESSION; MASS SPECTROSCOPY; PRINCIPAL COMPONENT REGRESSION;

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 0344185346     PISSN: 08946507     EISSN: None     Source Type: Journal    
DOI: 10.1109/TSM.2003.818962     Document Type: Article

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