Process control based on quadrupole mass spectrometry

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 14, Issue 1, 1996, Pages 489-493

  Greve, D W ^a   Knight, T J ^a   Cheng, X ^a   Krogh, B H ^a   Gibson, M A ^a   LaBrosse, J ^b  

^a CARNEGIE MELLON UNIVERSITY   (United States)

^b MKS Instruments   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000379030     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.588500     Document Type: Article

References (10)

1. C. Spanos, paper presented at the Third International Workshop on Advanced Plasma Tools, San Jose, CA, May 1995.
2. J. Hosch, paper presented at the Third International Workshop on Advanced Plasma Tools, San Jose, CA, May 1995.
3. S. W. Butler, K. J. McLaughlin, T. F. Edgar, and I. Trachtenberg, J. Electrochem. Soc. 138, 2727 (1991).
4. M. Elta et al., in Proceedings of the 1993 American Control Conference, edited by A. H. Haddad (American Automatic Control Conference, New York, 1993), pp. 2990-2997.
5. R. H. M. van de Leur, A. J. G. Shellingerhout, J. E. Mooij, and F. Tuinstra, Appl. Phys. Lett. 52, 1005 (1988).
6. K. R. Evans, R. Kaspi, C. R. Jones, R. E. Sherriff, V. Jogai, and D. C. Reynolds, J. Cryst. Growth 127, 523 (1993).
7. In surface science studies, the stability and reproducibility of quadrupole mass spectrometer data is regarded as of the order of ±4% [A. T. Gellman (private communication)].
8. D. B. Graves, Am. Inst. Chem. Eng. J. 35, 1 (1989).
9. D. L. Smith, A. S. Alimonda, D.-C. Chen. S. E. Ready, and B. Wacker, J. Electrochem. Soc. 137, 614 (1990).
10. T. J. Knight et al., in Proceedings of the 32nd Allerton Conference on Communication, Control, and Computing, edited by W. K. Jenkins and D. V. Sarwate (University of Illinois, Urbana-Champain, IL, 1994, pp. 765-773.