Optimal design of multilayered polysilicon films for prescribed curvature

Journal of Materials Science

Volumn 38, Issue 20, 2003, Pages 4169-4173

  Ni, A ^a   Sherman, D ^a   Ballarini, R ^a   Kahn, H ^a   Mi, B ^a   Phillips, S M ^a   Heuer, A H ^a  

^a CASE WESTERN RESERVE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALGORITHMS; CHEMICAL VAPOR DEPOSITION; COMPUTATIONAL METHODS; EIGENVALUES AND EIGENFUNCTIONS; ELASTIC MODULI; MIRRORS; POLYSILICON; RESIDUAL STRESSES; STRESS CONCENTRATION;

CIRCULAR MICROMIRROR DEVICE; DIRECT SEARCH OPTIMIZATION ALGORITHM; EIGENSTRAIN DISTRIBUTION; POLYSILICON FILM;

THIN FILMS;

EID: 0344153265     PISSN: 00222461     EISSN: None     Source Type: Journal    
DOI: 10.1023/A:1026333707011     Document Type: Article

References (3)

1. J. Yang, H. Kahn, A. He, S.M. Phillips and A.H. Heuer, IEEE Journal of Microelectromech. Syste. 9(4) (2000) 485.
2. P. Temple-Boyer, E. Imbernon, B. Rousset and E. Scheid, Mater. Res. Soc. Symp. Proc. 518 (1998) 208.
3. H. Kahn, S. Stemmer, K. Nandakumar, A. H. Heuer, R. L. Mullen, R. Ballarini and M. A. Huff, "Mechanical Properties of Relatively Thick, Surface Micromachined Polysilicon Films," in Proceedings, IEEE The Ninth Annual International Workshop on Micro Electro Mechanical Systems, San Diego, California, Feb. 11-15, 1996, p. 343.