Micromachined actuator for nanopositioning in two dimensions

Sensors and Actuators, A: Physical

Volumn 76, Issue 1-3, 1999, Pages 459-462

  Ayela, F ^a   Chaussy, J ^a   Fournier, T ^a   Menegaz, E ^a  

^a CNRS   (France)

Author keywords

[No Author keywords available]

Indexed keywords

DIAPHRAGMS; ELECTRIC CONDUCTIVITY; MICROMACHINING; REACTIVE ION ETCHING; SEMICONDUCTOR DOPING; SILICON WAFERS;

CAPACITIVE DETECTION; ELECTROSTATIC FORCE; INSULATED ELECTRODES; PYREX SUBSTRATE;

ACTUATORS;

EID: 0343932629     PISSN: 09244247     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0924-4247(99)00010-2     Document Type: Article

References (4)

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2. Kolb P.W., Decca R.S., Drew H.D. Capacitive sensor for micropositioning in two dimensions. Rev. Sci. Instr. 69:1998;310-312.
3. Zhang Z.L., MacDonald N.C. A RIE process for submicron silicon electromechanical structures. J. Micromech. Microeng. 2:1992;31-384.
4. Jansen H., Gardeniers H., de Boer M., Elwenspoek M., Fluitman J. A survey on the reactive ion etching of silicon in microtechnology. J. Micromech. Microeng. 6:1996;14-28.