High accuracy resonant pressure sensor by fusion bonding and trench etching

Sensors and Actuators, A: Physical

Volumn 76, Issue 1-3, 1999, Pages 298-304

  Welham, Christopher J ^a   Greenwood, John ^a   Bertioli, Michael M ^a  

^a Druck Ltd   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

ATMOSPHERIC PRESSURE; DIAPHRAGMS; ELECTROSTATIC DEVICES; ETCHING; FINITE ELEMENT METHOD; FUSION REACTIONS; PIEZOELECTRIC DEVICES; RESONATORS; SENSITIVITY ANALYSIS;

PRESSURE SENSOR; SIMPLE BEAM THEORY; TRENCH ETCHING; WAFER THINNING;

PARTIAL PRESSURE SENSORS;

EID: 0343932622     PISSN: 09244247     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0924-4247(99)00065-5     Document Type: Article

References (9)

1. Klassen E.H., Peterson K., Noworolski J.M., Logan J., Maluf N.I., Brown J., Storment C., McCulley W., Kovas G.T.A. Silicon fusion bonding and deep reactive ion etching: a new technology for microstructures. Sensors and Actuators A. 52:1996;132-139.
2. B.P. van Drieënhuizen, M.I. Maluf, I.E. Opris, G.T.A. Kovacs, Force-balanced accelerometer with mG resolution, fabricated using silicon fusion bonding and deep reactive ion etching, Digest of Technical Papers, International Conference on solid state sensors and actuators, Transducers '97, Vol. 2 Chicago IL (1997), pp. 4B2. 12PL.
3. P.-A. Clerc, L. Dellmann, F. Grétillat, M.-A. Grétillat, P.-F. Indermühle, S. Jeanneret, Ph. Luginbuhl, C. Marxer, T.L. Pfeffer, G.-A. Racine, S. Roth, U. Staufer, C. Stebler, P. Thiebaud, N.F. de Rooij, Advanced deep reactive ion etching a versatile tool for microelectromechanical systems, Proc. MME, Ulvik, Norway, 1998, p. A23.
4. C.J. Welham, A silicon micromachined lateral resonant pressure sensor, PhD Thesis, University of Warwick, Coventry, UK, April 1996.
5. Greenwood J.C., Wray T. High accuracy pressure measurement with a silicon resonant sensor. Sensors and Actuators A. 37-38:1993;82-85.
6. Cho Y.-H., Kwak B.M., Pisano A.P., Howe R.T. Slide film damping in laterally driven microstructures. Sensors and Actuators A. 40:1994;31-39.
7. Blom F.R., Bouwstra S., Elwenspoek M., Fluitman J.H.J. Dependence of the quality factor of micromachined silicon beam resonators on pressure and geometry. J. Vac. Sci. Technol. B. 10:1992;19-26.
8. J.K. Bhardwaj, H. Ashraf, Advanced silicon etching using high density plasmas, Proc. SPIE, Micromachining and Microfabrication Process Technology, Austin, TX, Oct. 1995, pp. 224-233.
9. W.C. Tang, Electrostatic comb drive for resonant sensor and actuator applications, PhD Thesis, University of California, Berkeley, USA, October 1990.