Electron-stimulated reaction of C60 with a model etching gas, SF6

Journal of Applied Physics

Volumn 84, Issue 8, 1998, Pages 4603-4610

  Coquel, Jean Marc ^a   Hunt, Michael R C ^a,b   Siller, Lidija ^a   Palmer, Richard E ^a  

^a UNIVERSITY OF BIRMINGHAM   (United Kingdom)

^b UNIVERSITY OF NAMUR   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0343694667     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.368686     Document Type: Article

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