LPCVD vertical furnace optimization for undoped polysilicon film deposition

Journal De Physique. IV : JP

Volumn 9 I, Issue 8, 1999, Pages

  Rinaldi, A M ^a   Carra, S ^a   Rampoldi, M ^a   Martignoni, M C ^b   Masi, M ^b  

^a POLITECNICO DI MILANO   (Italy)

^b MEMC Electronic Materials SpA   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL REACTORS; ESTIMATION; FILM GROWTH; MATHEMATICAL MODELS; MICROELECTRONICS; POLYSILANES; SILICON WAFERS; THIN FILMS;

LOW PRESSURE CHEMICAL VAPOR DEPOSITION; POLYSILICON;

CHEMICAL VAPOR DEPOSITION;

EID: 0343390453     PISSN: 11554339     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1051/jp4:1999823     Document Type: Article

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