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Surface and Coatings Technology

Volumn 116-119, Issue , 1999, Pages 335-341

Characterization of a-C:H films with metal interlayers and mixed interfaces

(6) Nothe M a Buuron, A a Koch, F a Penkalla, H J a Rehbach, W P b Bolt, H a

a FORSCHUNGSZENTRUM JÜLICH (Germany)

b RWTH AACHEN UNIVERSITY (Germany)

Author keywords

a C:H; Adhesion; Graded coatings; Hollow cathode arc discharge; Metal interlayer

Indexed keywords

ADHESION; CARBON; INTERFACES (MATERIALS); PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SCANNING ELECTRON MICROSCOPY; SILICON; STEEL; TRANSMISSION ELECTRON MICROSCOPY;

HOLLOW CATHODE ARC DISCHARGE; PLASMA-ASSISTED PHYSICAL-CHEMICAL VAPOR DEPOSITION;

AMORPHOUS FILMS;

ADHESION; CARBON; COATING; SILICON; STEEL; STRUCTURE; VAPOR DEPOSITION;

EID: 0342980261 PISSN: 02578972 EISSN: None Source Type: Journal
DOI: 10.1016/S0257-8972(99)00066-3 Document Type: Conference Paper

Times cited : (2)

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