The role of the substrate surface area/reactor volume ratio in chemistry and kinetics of chemical vapor deposition

Journal De Physique. IV : JP

Volumn 9 I, Issue 8, 1999, Pages

  Teubner, M ^a   Antes, J ^a   Hu, Z ^a   Zhang, W ^a   Huttinger K J ^a  

^a UNIVERSITY OF KARLSRUHE   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL REACTORS; CHEMICAL VAPOR DEPOSITION; DEPOSITION; HYDROGEN; METHANE; MIXTURES; PRESSURE; REACTION KINETICS; SUBSTRATES; SURFACE PROPERTIES; TEMPERATURE;

DEPOSITION KINETICS; METHANE HYDROGEN MIXTURE; REACTOR VOLUME RATIO; SUBSTRATE SURFACE AREA;

CARBON;

EID: 0342955019     PISSN: 11554339     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1051/jp4:1999810     Document Type: Article

References (9)

1. Hüttinger, K. J., Adv. Mater.-CVD 4 (1998) 151.
2. Becker, A. and Hüttinger, K. J., Carbon 36 (1998) 225
3. Becker, A. and Hüttinger, K. J., Carbon 36 (1998) 117
4. Becker, A. and Hüttinger, K. J., Carbon 36 (1998) 201
5. Becker, A. and Hüttinger, K. J., Carbon 36 (1998) 213
6. Teubner, M., Hu, Z. and Hüttinger, K. J., Adv. Mater.-CVD, submitted
7. Antes, J. M., Hu, Z., Zhang, W. and Hüttinger, K. J., Carbon, submitted
8. Becker, A., Hu, Z. and Hüttinger, K. J., this conference.
9. Tesner, P.A., in Chemistry and Physics of Carbon, vol.19, (ed.: P.A. Thrower, M.Dekker, New York, 1984)pp.65-162.