Control of microstructure coarsening of a Ti substrate during diamond film deposition using Ar/H2/CH4 gas mixture

Thin Solid Films

Volumn 359, Issue 2, 2000, Pages 215-220

  Fu, Yongqing ^a   Lam Loh, Nee ^a   Yan, Bibo ^a   Sun, Chang Q ^b   Hing, Peter ^b  

^a NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

^b NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CRYSTAL MICROSTRUCTURE; FILM PREPARATION; SUBSTRATES; TITANIUM;

CHARPY IMPACT ENERGY;

DIAMOND FILMS;

EID: 0342756917     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(99)00750-6     Document Type: Article

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