Characteristics of SrBi2Ta2O9 thin films prepared by pulsed laser deposition for non-volatile memory applications

Thin Solid Films

Volumn 375, Issue 1-2, 2000, Pages 200-204

  Zhu, Xinhua ^a   Liu, Yiming ^a   An, Zhenghua ^a   Zhu, Tao ^a   Wu, Zhuangchun ^a   Yu, Tao ^a   Liu, Zhiguo ^a   Ming, Naiben ^a,b  

^a NANJING UNIVERSITY   (China)

^b CCAST WORLD LABORATORY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

CERAMIC MATERIALS; COERCIVE FORCE; FERROELECTRIC MATERIALS; FILM PREPARATION; LASER ABLATION; MORPHOLOGY; PLATINUM; PULSED LASER APPLICATIONS; SILICA; STRONTIUM COMPOUNDS; THIN FILMS; TITANIUM DIOXIDE;

STRONTIUM BISMUTH TANTALATE;

DIELECTRIC FILMS;

EID: 0342538886     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(00)01235-9     Document Type: Article

References (9)

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