Synthesis and characterization of Y2O3:Eu3+ thin films on silicon substrate by pulsed laser ablation

Journal of Physics D: Applied Physics

Volumn 33, Issue 11, 2000, Pages 1263-1266

  Gang, Gu ^a,b   Ong, P P ^a   Chen, Chu ^a   Roth, S ^b  

^a NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

^b MAX PLANCK INSTITUT FÜR FESTKÖRPERFORSCHUNG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; ATOMIC FORCE MICROSCOPY; CRYSTAL MICROSTRUCTURE; GRAIN SIZE AND SHAPE; LASER ABLATION; PHOTOLUMINESCENCE; PULSED LASER APPLICATIONS; SATURATION (MATERIALS COMPOSITION); SYNTHESIS (CHEMICAL); X RAY DIFFRACTION ANALYSIS; YTTRIUM COMPOUNDS;

PHOTOLUMINESCENCE INTENSITY DEPENDENCE; PULSED LASER ABLATION; SILICON SUBSTRATE; YTTRIUM OXIDE;

THIN FILMS;

EID: 0342521511     PISSN: 00223727     EISSN: None     Source Type: Journal    
DOI: 10.1088/0022-3727/33/11/303     Document Type: Article

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