Atomic force microscope based nanolithography of self-assembled organosilane monolayer resists

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 37, Issue 12 B, 1998, Pages 7148-7150

  Kim, Jinchul ^a   Oh, Young ^a   Lee, Haiwon ^a   Shin, Yongwoo ^b   Park, Sunwoo ^b  

^a Hanyang University   (South Korea)

^b University of Seoul   (South Korea)

Author keywords

Anodic oxidation; Atomic force microscope; Nanolithography; Organosilane; Self assembled monolayer

Indexed keywords

EID: 0342482575     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.37.7148     Document Type: Article

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