Room temperature mechanical behavior of silicon-doped TiAl alloys with grain sizes in the nano- and submicron-range

Acta Materialia

Volumn 49, Issue 2, 2001, Pages 299-311

  Bohn, R ^a   Klassen, T ^a   Bormann, R ^a,b  

^a INSTITUTE OF MATERIALS RESEARCH   (Germany)

^b HAMBURG UNIVERSITY OF TECHNOLOGY   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

BRITTLE FRACTURE; COMMINUTION; DOPING (ADDITIVES); GRAIN SIZE AND SHAPE; INTERMETALLICS; SILICON; THERMOANALYSIS; YIELD STRESS;

HIGH ENERGY MILLING;

TITANIUM ALLOYS;

EID: 0342468732     PISSN: 13596454     EISSN: None     Source Type: Journal    
DOI: 10.1016/S1359-6454(00)00312-8     Document Type: Article

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