A Simplified High-Speed Bipolar Process with Ti Salicide Metallization: Implementation of in situ p-doped polysilicon emitter

Physica Scripta T

Volumn 79, Issue , 1999, Pages 318-321

  Kaplan, W ^a,b   Pejnefors, J ^a   Linder, M ^a   Sanden M ^a   Karlin, T E ^a   Malm, G ^a   Zhang, S L ^a   Grahn, J V ^a   Ostling M ^a  

^a ROYAL INSTITUTE OF TECHNOLOGY   (Sweden)

^b ACREO AB   (Sweden)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0342357998     PISSN: 02811847     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Article

References (13)

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