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Volumn 44, Issue 2, 2003, Pages 127-147

Effects of thermal diffusion and substrate temperature on silicon deposition in an impinging-jet CVD reactor

Author keywords

[No Author keywords available]

Indexed keywords

APPROXIMATION THEORY; BUOYANCY; CHEMICAL VAPOR DEPOSITION; COMPUTER SIMULATION; MATHEMATICAL MODELS; SILICON; SUBSTRATES; THERMAL EFFECTS;

EID: 0242666806     PISSN: 10407782     EISSN: 15210634     Source Type: Journal    
DOI: 10.1080/713838191     Document Type: Article
Times cited : (6)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.