-
1
-
-
0021374024
-
A Mathematical Model of the Coupled Fluid Mechanics and Chemical Kinetics in a Chemical Vapor Deposition Reactor
-
M. E. Coltrin, R. J. Kee, and J. A. Miller, A Mathematical Model of the Coupled Fluid Mechanics and Chemical Kinetics in a Chemical Vapor Deposition Reactor, J. Electro-chem. Soc., vol. 131, pp. 425-434, 1984.
-
(1984)
J. Electro-Chem. Soc.
, vol.131
, pp. 425-434
-
-
Coltrin, M.E.1
Kee, R.J.2
Miller, J.A.3
-
2
-
-
0026186906
-
A Mathematical Model for the Hydrodynamics and Gas Phase Reactions in Silicon LPCVD in a Single Wafer Reactor
-
C. R. Kleijn, A Mathematical Model for the Hydrodynamics and Gas Phase Reactions in Silicon LPCVD in a Single Wafer Reactor, J. Electrochem. Soc., vol. 138, pp. 2190-2200, 1991.
-
(1991)
J. Electrochem. Soc.
, vol.138
, pp. 2190-2200
-
-
Kleijn, C.R.1
-
3
-
-
0022010419
-
Analysis of Multicomponent LPCVD process
-
K. F. Roenigk and K. F. Jensen, Analysis of Multicomponent LPCVD process, J. Electrochem. Soc., vol. 132, pp. 448-454, 1985.
-
(1985)
J. Electrochem. Soc.
, vol.132
, pp. 448-454
-
-
Roenigk, K.F.1
Jensen, K.F.2
-
4
-
-
0023539473
-
Fluid Mechanics of Chemical Vapor Deposition
-
in S. K. Samanta (ed.), Winter Annual Meeting of the American Society of Mechanical Engineers, Boston, MA, December 13-18
-
K. F. Jensen, D. I. Fotiadis, E. O. Einset, A. M. Kremer, and D. R. McKenna, Fluid Mechanics of Chemical Vapor Deposition, in S. K. Samanta (ed.), Interdisciplinary Issues in Materials Processing and Manufacturing, Winter Annual Meeting of the American Society of Mechanical Engineers, Boston, MA, December 13-18, 1987, pp. 565-585.
-
(1987)
Interdisciplinary Issues in Materials Processing and Manufacturing
, pp. 565-585
-
-
Jensen, K.F.1
Fotiadis, D.I.2
Einset, E.O.3
Kremer, A.M.4
McKenna, D.R.5
-
5
-
-
0024620141
-
A Mathematical Model of the Fluid Mechanics and Gas Phase Chemistry in a Rotating Disk CVD Reactor
-
M. E. Coltrin, R. J. Kee, and G. H. Evans, A Mathematical Model of the Fluid Mechanics and Gas Phase Chemistry in a Rotating Disk CVD Reactor, J. Electrochem. Soc., vol. 136, pp. 819-829, 1989.
-
(1989)
J. Electrochem. Soc.
, vol.136
, pp. 819-829
-
-
Coltrin, M.E.1
Kee, R.J.2
Evans, G.H.3
-
6
-
-
0005896759
-
Convection and Chemistry Effects in CVD—A 3-D Analysis for Silicon Deposition
-
M. Ducarroir, C. Bernard, and L. Vandenbulcke (eds.), Perpignan, France, 19-23 June
-
S. A. Gokoglu, M. Kuczmarski, P. Tsui, and A. Chait, Convection and Chemistry Effects in CVD—A 3-D Analysis for Silicon Deposition, M. Ducarroir, C. Bernard, and L. Vandenbulcke (eds.), Proc. Seventh European Conf. on Chemical Vapor Deposition, Perpignan, France, 19-23 June 1989, pp. C5-17-C5-34.
-
(1989)
Proc. Seventh European Conf. On Chemical Vapor Deposition
, pp. C5-17-C5-34
-
-
Gokoglu, S.A.1
Kuczmarski, M.2
Tsui, P.3
Chait, A.4
-
7
-
-
0028319448
-
Three-Dimensional Modeling of LPCVD Vertical Cold Wall Reactors
-
S. A. Amer, J. P. Couderc, and P. Duverneuil, Three-Dimensional Modeling of LPCVD Vertical Cold Wall Reactors, Comput. Chem. Eng., vol. 18, pp. s235-s239, 1994.
-
(1994)
Comput. Chem. Eng.
, vol.18
, pp. s235-s239
-
-
Amer, S.A.1
Couderc, J.P.2
Duverneuil, P.3
-
8
-
-
0026205351
-
Buoyancy, Soret, Dufour, and Variable Property Effects in Silicon Epitaxy
-
R. L. Mahajan and C. Wei, Buoyancy, Soret, Dufour, and Variable Property Effects in Silicon Epitaxy, J. Heat Transfer, vol. 113, pp. 688-695, 1991.
-
(1991)
J. Heat Transfer
, vol.113
, pp. 688-695
-
-
Mahajan, R.L.1
Wei, C.2
-
9
-
-
0022713347
-
CVD in Stagnation Point Flow
-
C. Houtman, D. B. Graves, and K. F. Jensen, CVD in Stagnation Point Flow, J. Electrochem. Soc., vol. 133, pp. 961-969, 1986.
-
(1986)
J. Electrochem. Soc.
, vol.133
, pp. 961-969
-
-
Houtman, C.1
Graves, D.B.2
Jensen, K.F.3
-
10
-
-
0000261715
-
A Study of 2- and 3-D Transport Phenomena in Horizontal Chemical Vapor Deposition Reactors
-
C. R. Kleijn and C. J. Hoogendoorn, A Study of 2- and 3-D Transport Phenomena in Horizontal Chemical Vapor Deposition Reactors, Chem. Eng. Sci., vol. 46, pp. 321-334, 1991.
-
(1991)
Chem. Eng. Sci.
, vol.46
, pp. 321-334
-
-
Kleijn, C.R.1
Hoogendoorn, C.J.2
-
11
-
-
0002986671
-
Chemical Vapor Deposition Modeling—An Assessment of Current Status
-
in K. E. Spear and G. W. Cullen (eds.), Seattle, WA, October
-
S. A. Gokoglu, Chemical Vapor Deposition Modeling—An Assessment of Current Status, in K. E. Spear and G. W. Cullen (eds.), Proc. Eleventh Int. Conf. on Chemical Vapor Deposition, Seattle, WA, October 1990, pp. 1-9.
-
(1990)
Proc. Eleventh Int. Conf. On Chemical Vapor Deposition
, pp. 1-9
-
-
Gokoglu, S.A.1
-
12
-
-
0022739459
-
A Mathematical Model of Silicon Chemical Vapor Deposition
-
M. E Coltrin, R. J. Kee, and J. A. Miller, A Mathematical Model of Silicon Chemical Vapor Deposition, J. Electrochem. Soc., vol. 133, pp. 1206-1213, 1986.
-
(1986)
J. Electrochem. Soc.
, vol.133
, pp. 1206-1213
-
-
Coltrin, M.E.1
Kee, R.J.2
Miller, J.A.3
-
13
-
-
84975341202
-
Thermal Diffusion in Metal-Organic Chemical Vapor Deposition
-
W. L. Holstein, Thermal Diffusion in Metal-Organic Chemical Vapor Deposition, J. Electrochem. Soc., vol. 135, pp. 1788-1793, 1988.
-
(1988)
J. Electrochem. Soc.
, vol.135
, pp. 1788-1793
-
-
Holstein, W.L.1
-
14
-
-
0036642052
-
Importance of Grid Refinement in Numerical Modeling of Chemical Vapor Deposition Processes
-
C. L. Leakeas and M. A. R. Sharif, Importance of Grid Refinement in Numerical Modeling of Chemical Vapor Deposition Processes, Numer. Heat Transfer B, vol. 42, pp. 1-16, 2002.
-
(2002)
Numer. Heat Transfer B
, vol.42
, pp. 1-16
-
-
Leakeas, C.L.1
Sharif, M.A.R.2
-
16
-
-
0027904426
-
2-D Modelling of a Non-confined Circular Impinging Jet Reactor; Si Chemical Vapour Deposition
-
Y. B. Wang, C. Chaussavoine, and F. Teyssandier, 2-D Modelling of a Non-confined Circular Impinging Jet Reactor; Si Chemical Vapour Deposition, J. Crystal Growth, vol. 126, pp. 373-395, 1993.
-
(1993)
J. Crystal Growth
, vol.126
, pp. 373-395
-
-
Wang, Y.B.1
Chaussavoine, C.2
Teyssandier, F.3
-
17
-
-
0003944113
-
-
Wiley, New York
-
R. B. Bird, W. E. Stewart, and E. N. Lightfoot, Transport Phenomena, Wiley, New York, 1960.
-
(1960)
Transport Phenomena
-
-
Bird, R.B.1
Stewart, W.E.2
Lightfoot, E.N.3
-
20
-
-
0005782423
-
-
Ph.D. thesis, Louisiana State University, Baton Rouge, LA
-
F. H. Moukalled, Adaptive Grid Solution Procedure for Elliptic Flows, Ph.D. thesis, Louisiana State University, Baton Rouge, LA, 1987.
-
(1987)
Adaptive Grid Solution Procedure for Elliptic Flows
-
-
Moukalled, F.H.1
-
21
-
-
26344440661
-
-
Ph.D. thesis, The University of Alabama, Tuscaloosa, AL
-
C. L. Leakeas, Chemical Vapor Deposition Modeling in a Non-confined Circular Impinging Jet Reactor at Atmospheric Pressure, Ph.D. thesis, The University of Alabama, Tuscaloosa, AL, 2001.
-
(2001)
Chemical Vapor Deposition Modeling in a Non-Confined Circular Impinging Jet Reactor at Atmospheric Pressure
-
-
Leakeas, C.L.1
-
22
-
-
0001121425
-
Numerical Simulation of Chemical Vapor Deposition Processes under Variable and Constant Property Approximations
-
W. K. S. Chiu, Y. Jaluria, and N. G. Glumac, Numerical Simulation of Chemical Vapor Deposition Processes under Variable and Constant Property Approximations, Numer. Heat Transfer A, vol. 37, pp. 113-132, 2000.
-
(2000)
Numer. Heat Transfer A
, vol.37
, pp. 113-132
-
-
Chiu, W.K.S.1
Jaluria, Y.2
Glumac, N.G.3
|